Top 10 similar words or synonyms for silicon

nitric    0.987433

occurring    0.980274

reducing    0.977047

chicken    0.974170

forming    0.974001

dust    0.973710

oxide    0.971727

metallic    0.971202

potassium    0.970774

ammonium    0.970587

Top 30 analogous words or synonyms for silicon

Article Example
លីចូម Lithium has been found effective in assisting the perfection of silicon nano-welds in electronic components for electric batteries and other devices.
ម៉ាញ៉េស្យូម Magnesium is used in super-strong, lightweight materials and alloys. For example, when infused with silicon carbide nanoparticles, it has extremely high specific strength.
លីចូម Some of the aforementioned compounds, as well as lithium perchlorate, are used in oxygen candles that supply submarines with oxygen. These can also include small amounts of boron, magnesium, aluminum, silicon, titanium, manganese, and iron.
អាសូត Many covalent binary nitrides are known. Examples include cyanogen ((CN)), triphosphorus pentanitride (PN), disulfur dinitride (SN), and tetrasulfur tetranitride (SN). The essentially covalent silicon nitride (SiN) and germanium nitride (GeN) are also known: silicon nitride in particular would make a promising ceramic if not for the difficulty of working with and sintering it. In particular, the group 13 nitrides, most of which are promising semiconductors, are isoelectronic with graphite, diamond, and silicon carbide and have similar structures: their bonding changes from covalent to partially ionic to metallic as the group is descended. In particular, since the B–N unit is isoelectronic to C–C, and carbon is essentially intermediate in size between boron and nitrogen, much of organic chemistry finds an echo in boron–nitrogen chemistry, such as in borazine ("inorganic benzene"). Nevertheless, the analogy is not exact due to the ease of nucleophilic attack at boron due to its deficiency in electrons, which is not possible in a wholly carbon-containing ring.
បរ Boron is a useful dopant for such semiconductors as silicon, germanium, and silicon carbide. Having one fewer valence electron than the host atom, it donates a hole resulting in p-type conductivity. Traditional method of introducing boron into semiconductors is via its atomic diffusion at high temperatures. This process uses either solid (BO), liquid (BBr), or gaseous boron sources (BH or BF). However, after the 1970s, it was mostly replaced by ion implantation, which relies mostly on BF as a boron source. Boron trichloride gas is also an important chemical in semiconductor industry, however not for doping but rather for plasma etching of metals and their oxides. Triethylborane is also injected into vapor deposition reactors as a boron source. Examples are the plasma deposition of boron-containing hard carbon films, silicon nitride-boron nitride films, and for doping of diamond film with boron.